Semiconductor device and method of fabricating the same

ABSTRACT

Provided are a semiconductor device and a method of fabricating the same. The semiconductor device may include a semiconductor substrate including a first region and a second region, a dummy separation pattern provided on the second region of the semiconductor substrate to have a recessed region at its upper portion, a first electrode provided on the first region of the semiconductor substrate, a dielectric layer covering the first electrode, a second electrode provided on the dielectric layer, and a remaining electrode pattern provided in the recessed region. The second electrode and the remaining electrode pattern may be formed of a same material.

CROSS-REFERENCE TO RELATED PATENT APPLICATIONS

This is a Divisional of U.S. application Ser. No. 16/110,658, filed onAug. 23, 2018, which is a Continuation in Part of U.S. application Ser.No. 15/093,033, filed on Apr. 7, 2016, which claims priority under 35U.S.C. § 119 to Korean Patent Application No. 10-2015-0066801, filed onMay 13, 2015, in the Korean Intellectual Property Office, the entirecontents of each of which are hereby incorporated by reference.

BACKGROUND OF THE INVENTION

The present disclosure relates to a semiconductor device and a method offabricating the same.

Due to their small-size, multifunctional, and/or low-costcharacteristics, semiconductor devices are widely used as importantelements in the electronic industry. With advances in the electronicindustry, semiconductor devices are becoming more integrated. In somecases, increased integration of semiconductor devices may result invarious technical issues. For example, as an integration density ofsemiconductor devices increase, patterns included in the semiconductordevices may have a decreasing line width and/or space and an increasingheight and/or aspect ratio. In some cases, one or more of a suchdecreased line width and/or space and increasing height and/or aspectratio of patterns of semiconductor devices may lead to one or more of anincreased difficulties in a layer deposition process according to whichsemiconductor devices are at least partially fabricated, reduceduniformity in an etching process according to which semiconductordevices are at least partially fabricated, and deterioration inreliability of the fabricated semiconductor devices.

SUMMARY

Some embodiments of the inventive concept provide a highly reliablesemiconductor device.

Some embodiments of the inventive concept provide a fabrication methodof preventing a double stepwise structure from being formed before apolishing process.

According to some embodiments of the inventive concept, a semiconductordevice may include a semiconductor substrate including a first regionand a second region, a dummy separation pattern provided on the secondregion of the semiconductor substrate to have a recessed region at itsupper portion, a first electrode provided on the first region of thesemiconductor substrate, a dielectric layer covering the firstelectrode, a second electrode provided on the dielectric layer, and aremaining electrode pattern provided in the recessed region. The secondelectrode and the remaining electrode pattern may be formed of a samematerial.

According to some embodiments of the inventive concept, a semiconductordevice may include a semiconductor substrate including a first regionand a second region, a dummy separation pattern provided on the secondregion of the semiconductor substrate to have a recessed region at itsupper portion, a remaining electrode pattern provided in the recessedregion, and a through electrode provided to penetrate the interlayeredinsulating layer, the remaining electrode pattern, and the dummyseparation pattern and to be extended into the semiconductor substrate.The remaining electrode pattern may be formed of a conductive layer.

According to some embodiments of the inventive concept, a semiconductordevice may include a semiconductor substrate including a first regionand a second region, landing pads provided on the first region of thesemiconductor substrate and spaced apart from each other by a firstspace, first dummy pads provided on the second region of thesemiconductor substrate and spaced apart from each other by a secondspace greater than the first space, a first electrode provided on thelanding pads, a dummy separation pattern provided between the firstdummy pads to have a recessed region at its upper portion, and aremaining electrode pattern filling the recessed region. The remainingelectrode pattern may be formed of a conductive layer.

According to some embodiments of the inventive concept, a method offabricating a semiconductor device may include preparing a semiconductorsubstrate including a first region and a second region, forming a dummyseparation pattern, which has a recessed region at its upper portion, onthe second region of the semiconductor substrate, forming a firstelectrode and a dielectric layer on the first region of thesemiconductor substrate, forming a second electrode covering thedielectric layer and a remaining electrode pattern filling the recessedregion, forming an interlayered insulating layer to cover the secondelectrode, the remaining electrode pattern, and the dummy separationpattern, and forming a through electrode to penetrate the interlayeredinsulating layer, the remaining electrode pattern, and the dummyseparation pattern and to be extended into the semiconductor substrate.The second electrode and the remaining electrode pattern may be formedof the same material.

BRIEF DESCRIPTION OF THE DRAWINGS

Example embodiments will be more clearly understood from the followingbrief description taken in conjunction with the accompanying drawings.The accompanying drawings represent non-limiting, example embodiments asdescribed herein.

FIGS. 1, 2A, 2B, 2C, 3, and 4 are sectional views illustrating a methodof fabricating a semiconductor device, according to some exampleembodiments of the inventive concepts.

FIG. 5 is a block diagram illustrating a conventional semiconductordevice, according to some example embodiments of the inventive concepts.

FIGS. 6A, 7A, 8A, 9A, 10A, 11A, 12A, 13A, and 14A are plan viewsillustrating a semiconductor device, according to some exampleembodiments of the inventive concepts.

FIGS. 6B, 7B, 8B, 9B, 10B, 11B, 12B, 13B, and 14B are sectional viewstaken along lines I-I′ of FIGS. 6A, 7A, 8A, 9A, 10A, 11A, 12A, 13A, and14A, respectively.

FIG. 15 is a schematic block diagram illustrating an example ofelectronic systems including a semiconductor device, according to someexample embodiments of the inventive concepts.

FIG. 16 is a schematic block diagram illustrating an example of memorycards including a semiconductor device, according to some exampleembodiments of the inventive concepts.

FIGS. 17A, 17B, 17C, 17D, 17E, 17F, 17G, 17H, 17I, 17J, 17K, 17L, 17M,17N, 17O, and 17P are sectional views illustrating a process offabricating a semiconductor device, according to some exampleembodiments of the inventive concept.

FIG. 18 is a sectional view illustrating a semiconductor deviceaccording to some example embodiments of the inventive concept.

FIG. 19 is a sectional view illustrating a semiconductor deviceaccording to some example embodiments of the inventive concept.

It should be noted that these figures are intended to illustrate thegeneral characteristics of methods, structure and/or materials utilizedin certain example embodiments and to supplement the written descriptionprovided below. These drawings are not, however, to scale and may notprecisely reflect the precise structural or performance characteristicsof any given embodiment, and should not be interpreted as defining orlimiting the range of values or properties encompassed by exampleembodiments. For example, the relative thicknesses and positioning ofmolecules, layers, regions and/or structural elements may be reduced orexaggerated for clarity. The use of similar or identical referencenumbers in the various drawings is intended to indicate the presence ofa similar or identical element or feature.

DETAILED DESCRIPTION

Example embodiments of the inventive concepts will now be described morefully with reference to the accompanying drawings, in which exampleembodiments are shown.

FIGS. 1, 2A, 2B, 2C, 3, and 4 are sectional views illustrating a methodof fabricating a semiconductor device, according to some exampleembodiments of the inventive concepts.

Referring to FIG. 1, a substrate 100 may be provided. The substrate 100may include a pair of first regions and a second region provided betweenthe pair of first regions.

First patterns 105 may be formed on the first regions of the substrate100, respectively, and second patterns 110 may be formed on the firstpatterns 105, respectively, to expose at least a portion of each of thefirst patterns 105.

In more detail, the formation of the first patterns 105 may includeforming a first layer (not shown) having a first thickness TK1 on thefirst and second regions of the substrate 100 and patterning the firstlayer to expose the second region of the substrate 100. The secondregion may include a first opening 115 that is defined by the substrate100 and the first patterns 105. The first opening 115 may have a depththat is substantially equal to the first thickness TK1, greater than thefirst thickness TK1, or smaller than the first thickness TK1.

In some example embodiments, the first opening 115 may have aline-shaped structure extending in a specific direction. Alternatively,the first opening 115 may have a hole-shaped structure. However, thefirst opening 115 may not be limited to the line-shaped structure orhole-shaped structure.

The formation of the second patterns 110 may include forming a secondlayer (not shown) on the substrate 100 provided with the first patterns105 to have a second thickness TK2 greater than the first thickness TK1,and patterning the second layer to expose at least a portion of thefirst patterns 105 and the second region of the substrate 100.Accordingly, a second opening 120, which is connected to the firstopening 115 and is defined by the first patterns 105 and the secondpatterns 110, may be formed on the first opening 115. The second opening120 may have a depth that is substantially equal to the second thicknessTK2.

Although not shown, in some example embodiments, at least one additionallayer may be inserted between the first pattern 105 and the secondpattern 110.

As shown in FIG. 1, the substrate 100 and the first and second patterns105 and 110 may be formed to define two stepwise portions. For example,the two stepwise portions may be formed between the substrate 100 andthe first pattern 105 and between the first pattern 105 and the secondpattern 110.

Referring to FIGS. 2A, 2B, and 2C, a dummy pattern 125 may be formed onthe second region of the substrate 100 to fill at least a portion of thefirst opening 115.

The dummy pattern 125 may be formed in at least one (e.g., a lower one)of the two stepwise portions. The dummy pattern 125 may enable reductionof a height difference of the semiconductor device as a result of thedummy pattern at least partially filling at least one of the twostepwise portions. The dummy pattern 125 may have a thickness DTK thatis substantially equal to or greater than the first thickness TK1,greater than the first thickness TK1, or smaller than the firstthickness TK1.

According to some example embodiments shown in FIG. 2A, the dummypattern 125 may be formed to completely cover or fill the first opening115. The dummy pattern 125 may have the same or similar structure to thefirst opening 115. According to some example embodiments shown in FIG.2B, the dummy pattern 125 may be formed to partially cover or fill thefirst opening 115. The dummy pattern 125 may have a different structurefrom the first opening 115. For example, the dummy pattern 125 may havea patterned structure (e.g., shaped like a contact plug) provided in thefirst opening 115. According to another example embodiment shown in FIG.2C, the dummy pattern 125 may be formed to completely cover or fill thefirst opening 115 and partially cover a portion of the first pattern 105adjacent to the first opening 115.

In some example embodiments, the dummy pattern 125 may be formed at thesame time when the second pattern 110 is formed. In some exampleembodiments, the dummy pattern 125 may be formed of or includesubstantially the same material as the second pattern 110, such that thedummy pattern 125 and the second pattern 110 include substantiallycommon materials.

As shown, the dummy pattern 125 may be an electrically floatingstructure. For example, the dummy pattern 125 may not be electrically orphysically connected to any other conductive structure. Furthermore, thedummy pattern 125 may be formed of or include a conductive or insulatingmaterial.

Referring to FIGS. 3 and 4, a third layer 130 may be formed on thesubstrate 100 to fill the second opening 120 provided with the dummypattern 125, and an upper portion of the third layer 130 may be polishedto form a third pattern 140 having a surface 141 (see FIG. 4) andcovering the first and second patterns 105 and 110.

Where the dummy pattern 125 is provided, a stepwise portion 145 may beomitted from the third layer 130. A third pattern 130 including asufficient thickness to enable the third pattern 140 (see FIG. 4) tohave a desired polishing surface 141 may have a lowest surface that isgreater in height than the desired polishing surface 141. Where stepwiseportion 145 is omitted from the third layer 130, the lowest surface ofthe third layer 130 may be surface 144, rather than the lower surface143 of the stepwise portion 145. Thus, the thickness of the third layer130 may be reduced by a height DTK (e.g., the first thickness TK1) ofthe dummy pattern 125, so that the surface 144 is at the height ofsurface 143 above the height of the desired polishing surface 141 shownin FIG. 3. Namely, a portion 135 of the third layer 130 may beeliminated from formation. Elimination of the portion 135 from formationmay result in a reduced formation of the third layer 130. A reducedformation of the third layer 130 may result in a decrease in a cost offorming the third layer 140 (see FIG. 4). In addition, because thestepwise portion 145 may be omitted from the third layer 130 as a resultof the dummy pattern 125 being provided, the resulting profile of thethird layer may have fewer stepwise portions. Such a reduction instepwise portions in the profile of the third layer 130 may result in animproved thickness uniformity of the polishing process to establish adesired polishing surface 141.

In some example embodiments, where the first opening 115 is filled withthe dummy pattern 125, the number (“quantity”) of the stepwise portionsdefined between the substrate 100 and the first and second patterns 105and 110 may be reduced, as at least one stepwise portion may be at leastpartially filled by the dummy pattern 125. As a result, a height thatthe third layer 130 is formed may be reduced, as a correspondingstepwise portion 145 in the third layer 130 may be omitted. Because thecorresponding stepwise portion 145 in the third layer 130 may beomitted, as shown in FIG. 3, the height of the third layer 130 that atleast uniformly reaches the target height of a polished surface 141 maybe less (by thickness DTK as shown in FIG. 3) than if the stepwiseportion 145 were not omitted. This may make it possible to improvethickness uniformity of the polishing process, based at least in partupon the reduced amount or portion 135 of the third layer 130 to bepolished to establish a uniform surface 141, as shown in FIG. 4.

Hereinafter, a dynamic random access memory (DRAM) device will bedescribed as an example of the semiconductor device. But exampleembodiments of the inventive concepts may not be limited to the example,in which the DRAM device is the semiconductor device.

FIG. 5 is a block diagram illustrating a conventional semiconductordevice.

Referring to FIG. 5, a semiconductor device may include a cell regionprovided with memory cells and a non-cell region provided around thecell region. The non-cell region may be provided to surround the cellregion and may include a core/peripheral region, which is configured toenable electrical signal transmission from/to the memory cells, and ascribe line defining a plurality of cell regions.

In some example embodiments, the scribe line may serve as a sawing linefor cutting or dividing the cell regions of the semiconductor deviceinto unit chips. Furthermore, auxiliary structures, such as a photo key,an electrical test pattern, and a measurement site, may be provided onthe scribe line. The photo key may be used as, for example, a patternfor aligning it with an underlying structure, when a photolithographyprocess is performed to form a plurality of structures on the cellregions. The electrical test pattern may be used to measure anelectrical signal associated with each or some of layers of thesemiconductor device, during a process of forming a plurality ofstructures on the cell regions. The measurement site may be used tomeasure physical or optical properties (e.g., a layer thickness) of eachor some of the layers, in a process of forming a plurality of structureson the cell regions.

Hereinafter, a method of fabricating a semiconductor device will beexemplarily described with reference to the portion A of FIG. 5.

FIGS. 6A, 7A, 8A, 9A, 10A, 11A, 12A, 13A, and 14A are plan viewsillustrating a semiconductor device according to some exampleembodiments of the inventive concepts, and FIGS. 6B, 7B, 8B, 9B, 10B,11B, 12B, 13B, and 14B are sectional views taken along lines I-I′ ofFIGS. 6A, 7A, 8A, 9A, 10A, 11A, 12A, 13A, and 14A, respectively.

Referring to FIGS. 6A and 6B, a device isolation pattern 210 may beformed on a substrate 200 including cell regions CLR and a non-cellregion to define active patterns 205, and cell transistors 220 may beformed on the cell regions CLR.

In more detail, the substrate 200 may be etched to form a trench TRC,and the trench TRC may be filled with an insulating layer (e.g., ofsilicon oxide, silicon nitride, and silicon oxynitride) to form thedevice isolation pattern 210. Next, the substrate 200 may be etched toform recesses RC. The recesses RC may be formed to cross the activepatterns 205 defined by the device isolation pattern 210 and may beparallel to each other. A gate insulating layer 212 may be formed in therecesses RC, and gate electrodes 214 may be formed to fill lowerportions of the recesses RC provided with the gate insulating layer 212.The gate insulating layer 212 may be formed of or include at least oneof silicon oxide or high-k metal oxides (e.g., hafnium oxide or aluminumoxide). The gate electrode 214 may be formed of or include at least oneof doped silicon, metals (e.g., tungsten or copper), or metal compounds(e.g., titanium nitride or tungsten nitride). In addition, each of thegate electrodes 214 may extend in a first direction DR1. For example, apair of gate electrodes 214 may be formed to cross each of the activepatterns 205. First capping patterns 216 may be formed on the gateelectrodes 214, respectively, to fill upper portions of the recesses RC.Each of the first capping patterns 216 may be formed of or include aninsulating material (e.g., silicon oxide, silicon nitride, and siliconoxynitride). First and second impurity regions 218 a and 218 b may beformed in portions of the active patterns 205 exposed by each of thefirst capping patterns 216. The first and second impurity regions 218 aand 218 b may be formed via injecting impurities into the portions ofthe active patterns 205 exposed by each of the first capping patterns216. The cell transistors 220 may be formed in such a way that channelregions thereof are positioned below a top surface of the substrate 200;that is, the cell transistors 220 may have a structure called a buriedchannel array transistor (BCAT).

Thereafter, a first interlayered insulating layer 225 may be formed onthe substrate 200 to cover the cell transistor 220. The firstinterlayered insulating layer 225 may be formed of or include aninsulating material (e.g., silicon oxide, silicon nitride, and siliconoxynitride). After the formation of the first interlayered insulatinglayer 225, a polishing process may be performed to polish a top surfaceof the first interlayered insulating layer 225.

When the cell transistors 220 and the first interlayered insulatinglayer 225 are formed on the cell regions CLR, a first structure 210 aresembling the device isolation pattern 210 and a second structure 220 aresembling the cell transistor 220 may be respectively formed in acore/peripheral region CPR and a scribe line SCL. Here, the expression“resembling” means that the first and second structures 210 a and 220 ainclude the same materials as the device isolation pattern 210 and thecell transistor 220 but are different from the device isolation pattern210 and the cell transistor 220 in terms of their structures orpositions. Although a detailed description will be omitted, the firstand second structures 210 a and 220 a may have a variety of structures.The first and second structures 210 a and 220 a may not be formed in thecore/peripheral region CPR and the scribe line SCL or may be formed in aportion thereof.

Referring to FIGS. 7A and 7B, the first interlayered insulating layer225 may be patterned to form first contact holes 230 exposing the firstimpurity regions 218 a, respectively.

In some example embodiments, when a photolithography process using amask (not shown) is performed to form the first contact holes 230 on thecell region CLR, the photo key formed on the scribe line SCL (e.g., seeFIG. 5) may be opened or exposed before the photolithography process, soas to allow the mask to be aligned with the photo key. The first andsecond structures 210 a and 220 a may be exposed when the photo key onthe scribe line SCL is opened. For example, in the case where the firstinterlayered insulating layer 225 includes oxide and the first structure210 a resembling the device isolation pattern 210 includes a material(e.g., oxide) similar to that of the device isolation pattern 210, anexposed portion of the first structure 210 a may be etched in theprocess of forming the first contact hole 230, and as a result, thefirst opening 230 a may be formed on the scribe line SCL.

As shown in FIGS. 7A and 7B, the first opening 230 a may be formed tohave a hole-shaped structure, but in some example embodiments, whenviewed in plan view, the first opening 230 a may have a line-shaped orpatterned structure extending in a specific direction or variousstructures (e.g., circular, elliptical, or polygonal structures).

In some example embodiments, the first opening 230 a on the scribe lineSCL may be formed during the photolithography process, but in someexample embodiments, the first opening 230 a may be formed when theauxiliary structures (e.g., electrical test patterns or measurementsites) for testing the structures of FIGS. 7A and 7B are exposed.Furthermore, the first opening 230 a may be formed on not only thescribe line SCL but also the core/peripheral region CPR.

Referring to FIGS. 8A and 8B, the first contact holes 230 may be filledwith a first conductive material to form first contact plugs 235electrically coupled to the first impurity regions 218 a. The firstconductive material may include at least one of doped silicon, metals(e.g., tungsten or copper), or metal compounds (e.g., titanium nitrideor tungsten nitride).

In some example embodiments, when the first contact holes 230 are filledwith the first conductive material, the first opening 230 a may also befilled with the first conductive material to form a first dummy pattern235 a. The first dummy pattern 235 a may be in an electrically floatingstate. In other words, the first dummy pattern 235 a may be electricallyand physically isolated from any other conductive structure. When thefirst dummy pattern 235 a is electrically or physically connected toother structure, the other structure may be in an electrically floatingstate.

In some example embodiments, at least a portion of the first opening 230a may be filled with the first conductive material and may have an emptystructure.

According to some example embodiments, the first dummy pattern 235 a maybe formed to completely fill the first opening 230 a and have the samestructure as the first opening 230 a. According to some exampleembodiments, the first dummy pattern 235 a may be formed to partiallycover or fill the first opening 230 a to have a structure smaller thanor different from the first opening 230 a. For example, the first dummypattern 235 a may have a patterned structure or a contact plugstructure. According to some example embodiments, the first dummypattern 235 a may be formed to cover or fill the first opening 230 a andto partially cover the first interlayered insulating layer 225, andthus, the first dummy pattern 235 a may have a structure greater than ordifferent from the first opening 230 a.

Referring to FIGS. 9A and 9B, bit line structures electrically coupledto the first contact plugs 235 may be formed on the cell regions CLR anda core/peripheral gate electrode structure may be formed on thecore/peripheral region CPR. The bit line structures may electricallycouple the first contact plugs 235 to each other.

In more detail, a first conductive layer (not shown) and a mask layer(not shown) may be sequentially formed on the first interlayeredinsulating layer 225. The first conductive layer may be formed of orinclude at least one of doped silicon, metals (e.g., tungsten orcopper), or metal compounds (e.g., titanium nitride or tungstennitride). In the case where the first opening 230 a is not filled withthe first conductive material of the first contact plug 235, the firstconductive layer may be formed to fill the first opening 230 a, andthus, the first dummy pattern 235 a may be formed in the first opening230 a. The first dummy pattern 235 a may be in an electrically floatingstate. The first dummy pattern 235 a may be formed to have the samestructure as that described with reference to FIGS. 8A and 8B, and inorder to avoid redundancy, a detailed explanation of the first dummypattern 235 a is omitted.

Next, the first mask layer and the first conductive layer may bepatterned by a photolithography process using a mask, to form the bitline structure and the core/peripheral gate electrode structure. Here,the bit line structure may include second capping patterns 242 and bitlines 240, and the core/peripheral gate electrode structure may includea core/peripheral capping pattern 242 a and a core/peripheral gateelectrode 240 a.

As shown in FIG. 9A, the bit lines 240 may be formed parallel to asecond direction DR2 perpendicular to the first direction DR1 and may beparallel to each other, on the cell regions CLR. In some exampleembodiments, the gate electrode structure and the bit line structuresare formed on the core/peripheral region CPR and the cell regions CLR,respectively, but a structure corresponding to the gate electrodestructure or the bit line structure may not be formed on the scribe lineSCL.

A second interlayered insulating layer 245 may be formed on thesubstrate 200 to cover the bit line structure, the core/peripheral gateelectrode structure, and the scribe line SCL. The second interlayeredinsulating layer 245 may be formed of or include an insulating material(e.g., silicon oxide, silicon nitride, and silicon oxynitride).

Referring to FIGS. 10A and 10B, the second interlayered insulating layer245 and the first interlayered insulating layer 225 may be patterned toform second contact holes 250 exposing the second impurity regions 218b, respectively. The second contact holes 250 may be formed on the cellregion CLR.

In some example embodiments, when a photolithography process using amask (not shown) is performed to form the second contact holes 250 onthe cell region CLR, the photo key formed on the scribe line SCL (e.g.,see FIG. 5) may be opened or exposed before the photolithographyprocess, so as to allow the mask to be aligned with the photo key. Thefirst and second structures 210 a and 220 a on the scribe line SCL andthe core/peripheral region CPR may be exposed, when the photo key on thescribe line SCL is opened. For example, in the case where the secondinterlayered insulating layer 245 includes oxide and the first structure210 a resembling the device isolation pattern 210 includes a material(e.g., oxide) similar to that of the device isolation pattern 210, anexposed portion of the first structure 210 a may be etched in theprocess of forming the second contact hole 250, and as a result, thesecond openings 250 a may be formed on the scribe line SCL and thecore/peripheral region CPR. The second openings 250 a may have a varietyof differing sectional shapes.

As shown in FIGS. 10A and 10B, each of the second openings 250 a may beformed to have a hole-shaped structure, but in some example embodiments,when viewed in a plan view, each of the second openings 250 a may have aline-shaped structure extending in a specific direction or variousstructures (e.g., circular, elliptical, or polygonal structures).

In some example embodiments, the second openings 250 a on the scribeline SCL and the core/peripheral region CPR may be formed during thephotolithography process, but in some example embodiments, the secondopenings 250 a may be formed when the auxiliary structures (e.g.,electrical test patterns or measurement sites) for testing thestructures of FIGS. 10A and 10B are exposed.

Referring to FIGS. 11A and 11B, the second contact holes 250 may befilled with a second conductive material to form second contact plugs255 electrically coupled to the second impurity regions 218 b. Thesecond conductive material may be formed of or include at least one ofdoped silicon, metals (e.g., tungsten or copper), or metal compounds(e.g., titanium nitride or tungsten nitride).

In some example embodiments, when the second contact holes 250 arefilled with the second conductive material, the second opening 250 a mayalso be filled with the second conductive material to form a seconddummy pattern 255 a. The second dummy pattern 255 a may be in anelectrically floating state. The second dummy pattern 255 a may be, forexample, a pillar-shaped structure penetrating the first and secondinterlayered insulating layers 225 and 245. Alternatively, the seconddummy pattern 255 a may include a pillar portion penetrating the firstand second interlayered insulating layers 225 and 245 and a coverportion connected to the pillar portion. In this case, the second dummypattern 255 a may have a “T”-shaped section.

According to some example embodiments, the second dummy pattern 255 amay be formed to completely fill the second opening 250 a and havesubstantially the same structure as the second opening 250 a. Accordingto some example embodiments, the second dummy pattern 255 a may beformed to partially cover or fill the second opening 250 a to have astructure smaller than or different from the second opening 250 a.According to some example embodiments, the second dummy pattern 255 amay be formed to cover or fill the second opening 250 a and to partiallycover the first interlayered insulating layer 225, and thus, the seconddummy pattern 255 a may have a structure greater than or different fromthe second opening 250 a.

Referring to FIGS. 12A and 12B, capacitors CAP may be connected to thesecond contact plugs 255, respectively. The capacitors CAP may be formedon the cell region CLR.

In more detail, a third interlayered insulating layer (not shown) may beformed to cover the second contact plugs 255, and the third interlayeredinsulating layer may be etched to form holes (not shown) exposing thesecond contact plugs 255, respectively. A first electrode layer (notshown) may be conformally formed on the third interlayered insulatinglayer provided with the holes. The first electrode layer may be formedin such a way that the holes are not completely filled therewith. Theholes provided with the first electrode layer may be filled with asacrificial layer (not shown). The sacrificial layer and the firstelectrode layer may be etched to expose a top surface of the thirdinterlayered insulating layer, and thus, first electrodes 262 having acylinder shape may be formed in the holes. After the formation of thefirst electrodes 262, the sacrificial layer and the third interlayeredinsulating layer may be removed. In some example embodiments, supporterrings (not shown) may be additionally formed to prevent the firstelectrodes 262 having a high aspect ratio from being leaned or fallen.

A dielectric layer 264 may be formed to conformally cover inner andouter sidewalls of the first electrodes 262. Second electrodes 266 maybe formed to fill spaces in or out of the first electrodes 262 providedwith the dielectric layer 264. Here, each of the capacitors CAP mayinclude the first electrode 262, the dielectric layer 264, and thesecond electrode 266.

Referring to FIGS. 13A and 13B, a plate electrode layer 270 may beformed to connect the second electrodes 266 of the capacitors CAP toeach other. The plate electrode layer 270 may be formed of or includesilicon germanium.

Since a structure corresponding to the bit line structure or thecore/peripheral gate electrode structure is not formed on the scribeline SCL (e.g., see FIGS. 9A and 9B), a stepwise region 260 at a leveldifferent from the cell region CLR and the core/peripheral region CPRmay be formed on the scribe line SCL. The stepwise region 260 may have aline-shaped structure extending in the first direction DR1. The stepwiseregion 260 may be filled with the plate electrode layer 270 to form athird dummy pattern 270 a. The third dummy pattern 270 a may be in anelectrically floating state.

According to some example embodiments, the third dummy pattern 270 a maybe formed to completely fill the stepwise region 260 and havesubstantially the same structure as the stepwise region 260. Accordingto some example embodiments, the third dummy pattern 270 a may be formedto partially cover or fill the stepwise region 260 to have a structuresmaller than or different from the stepwise region 260. According tosome example embodiments, the third dummy pattern 270 a may be formed tocover the stepwise region 260 and have an upward-protruding structure.

Referring to FIGS. 14A and 14B, a fourth interlayered insulating layer275 may be formed on the substrate 200 provided with the plate electrodelayer 270. Thereafter, a polishing process may be performed to polish atop surface of the fourth interlayered insulating layer 275.

As described above, the capacitors CAP and the bit lines 240 may beformed on the cell region CLR but not on the scribe line SCL, and thus,the stepwise region 260 with a very large depth may be formed betweenthe cell region CLR and the scribe line SCL. In the present embodiment,the third dummy pattern 270 a may be formed between the bit lines 240(i.e., on the scribe line SCL), and this may reduce a height differenceof the stepwise region 260 between the cell region CLR and the scribeline SCL and between the core/peripheral region and the scribe line SCL.

Accordingly, a thickness of the fourth interlayered insulating layer 275may be reduced by a height of the third dummy pattern 270 a, and thismakes it possible for the fabrication process to be performed with lowercost and higher productivity. Furthermore, it is possible to improveuniformity in thickness of the fourth interlayered insulating layer 275,on which the polishing process is performed.

FIG. 15 is a schematic block diagram illustrating an example ofelectronic systems including a semiconductor device according to someexample embodiments of the inventive concepts.

Referring to FIG. 15, an electronic system 1100 may include a controller1110, an input-output (I/O) unit 1120, a memory device 1130, aninterface 1140, and a bus 1150. The controller 1110, the input-outputunit 1120, the memory device 1130 and/or the interface 1140 may beconnected or coupled to each other via the bus 1150 serving as a pathwayfor data communication. At least one of the controller 1110, theinput-output unit 1120, the memory device 1130, and/or the interface1140 may include a semiconductor device according to some exampleembodiments of the inventive concepts.

The controller 1110 may include, e.g., at least one of a microprocessor,a digital signal processor, a microcontroller, or another logic device,which is configured to have a similar function to any one of themicroprocessor, the digital signal processor, and the microcontroller.The input-output unit 1120 may include a keypad, keyboard, a displaydevice, and so forth. The memory device 1130 may be configured to storedata and/or command. The interface unit 1140 may transmit electricaldata to a communication network or may receive electrical data from acommunication network. The interface unit 1140 may operate in a wirelessor wireless manner. For example, the interface unit 1140 may include anantenna for wireless communication or a wireless transceiver forwireless communication. Although not shown in the drawings, theelectronic system 1100 may further include a fast DRAM device and/or afast SRAM device which acts as a cache memory for improving an operationof the controller 1110.

The electronic system 1100 may be applied to a personal digitalassistant (PDA), a portable computer, a web tablet, a wireless phone, amobile phone, a digital music player, a memory card, or an electronicproduct, which is configured to receive or transmit information datawirelessly.

FIG. 16 is a schematic block diagram illustrating an example of memorycards including a semiconductor device according to some exampleembodiments of the inventive concepts.

Referring to FIG. 16, at least one semiconductor memory device 1210according to some example embodiments of the inventive concepts may beused in a memory card 1200 with a large memory capacity. The memory card1200 may include a memory controller 1220 configured to control a dataexchange operation between a host and the semiconductor memory device1210.

A static random access memory (SRAM) 1221 may be used as an operationmemory of a processing unit 1222. A host interface 1223 may include dataexchange protocols of a host to be connected to the memory card 1200. Anerror correction block 1224 may be configured to detect and correcterrors included in data readout from a multi bit semiconductor memorydevice 1210. A memory interface 1225 may be configured to interface withthe semiconductor memory device 1210. The processing unit 1222 mayperform every control operation for exchanging data of the memorycontroller 1220. Even though not depicted in drawings, it is apparent toone of ordinary skill in the art that the memory card 1200 according tosome example embodiments of the inventive concepts may further include aROM (not shown) storing code data for interfacing with the host.

FIGS. 17A, 17B, 17C, 17D, 17E, 17F, 17G, 17H, 17I, 17J, 17K, 17L, 17M,17N, 17O, and 17P are sectional views illustrating a process offabricating a semiconductor device, according to some exampleembodiments of the inventive concept.

Referring to FIG. 17A, a semiconductor substrate 301 including a firstregion A1, a second region B1, and a third region C1 may be prepared.The first region A1 may be, for example, a cell array region. The secondregion B1 may be, for example, a peripheral circuit region. The thirdregion C1 may be, for example, a region, on which a through electrodewill be formed. The third region C1 may be provided at or near a centeror edge region or a center line of a semiconductor chip. The secondregion B1 may be provided between the first region A1 and the thirdregion C1. The semiconductor substrate 301 may be provided in the formof, for example, a single crystalline silicon wafer. A device isolationlayer 303 may be formed in the semiconductor substrate 301 to defineactive regions. The active regions, which are defined by the deviceisolation layer 303 in the first region A1, may have the same planarshapes as those shown in the cell regions CLR of FIG. 6A.

Although not shown, word lines may be provided on the first region A1 tocross the active regions. The word lines may be buried in thesemiconductor substrate 301, as shown in FIGS. 6A and 6B. A word linegate insulating layer may be interposed between the word lines and thesemiconductor substrate 301. Word line capping patterns may be providedon the word lines. In the first region A1, a first impurity injectionregion 305 a and a second impurity injection region 305 b may be formedin the semiconductor substrate 301 between the word lines.

A first interlayered insulating layer 307 may be formed on thesemiconductor substrate 301 to cover the first region A1. The firstinterlayered insulating layer 307 may be formed of or include, forexample, silicon nitride. The first interlayered insulating layer 307may be formed to expose top surfaces of the second and third regions B1and C1 of the semiconductor substrate 301. A peripheral gate insulatinglayer 309 may be formed on the semiconductor substrate 301 to cover thesecond and third regions B1 and C1. The peripheral gate insulating layer309 may be formed of or include, for example, at least one of siliconnitride or metal oxide materials. When the peripheral gate insulatinglayer 309 is formed, the first interlayered insulating layer 307 may beused as a mask covering the first region A1.

Referring to FIG. 17B, a first poly-silicon layer may be formed on thesemiconductor substrate 301. The first poly-silicon layer may be dopedwith impurities or may be formed of a doped silicon layer. The firstpoly-silicon layer may be patterned to form a first polysilicon maskpattern 311 on the first region A1, and here, the first polysilicon maskpattern 311 may be formed to have an opening defining a position of abit line contact DC to be formed in a subsequent step. The firstpolysilicon mask pattern 311 may be formed to cover the second region B1and the third region C1. The first interlayered insulating layer 307 andthe semiconductor substrate 301 may be patterned using the firstpolysilicon mask pattern 311 as an etch mask, and as a result, a bitline contact hole 313 may be formed to expose the first impurityinjection region 305 a. The device isolation layer 303 may also beetched, when the bit line contact hole 313 is formed.

Referring to FIG. 17C, a second poly-silicon layer may be formed on thesemiconductor substrate 301 to fill the bit line contact hole 313, andthen, a polishing process may be performed on the second poly-siliconlayer to expose the first polysilicon mask pattern 311 and to form asecond polysilicon pattern 314 in the bit line contact hole 313. A topsurface of the second polysilicon pattern 314 may be substantiallycoplanar with a top surface of the first polysilicon mask pattern 311. Afirst ohmic layer 315, a first metal containing layer 317, and a firstcapping layer 319 may be sequentially stacked on the second polysiliconpattern 314 and the first polysilicon mask pattern 311. The first ohmiclayer 315 may be formed of or include, for example, cobalt silicide. Thefirst metal containing layer 317 may be formed of or include, forexample, at least one of titanium nitride or tungsten. The first cappinglayer 319 may be formed of or include, for example, silicon nitride. Afirst mask pattern 321 may be formed on the first capping layer 319. Thefirst mask pattern 321 may be used to define a peripheral gate on thesecond region B1. The first mask pattern 321 may be formed to fullycover the first region A1 and to fully expose the third region C1. Thefirst mask pattern 321 may include, for example, at least one of aphotoresist pattern or a carbon containing layer.

Referring to FIG. 17D, the first capping layer 319, the first metalcontaining layer 317, the first ohmic layer 315, the first polysiliconmask pattern 311, and the peripheral gate insulating layer 309 may besequentially etched using the first mask pattern 321 as an etch mask soas to expose a top surface of the semiconductor substrate 301, and thus,a peripheral gate insulating pattern 309 b, a peripheral gate electrode323 b, and a peripheral capping pattern 319 b, which are sequentiallystacked, may be formed on the second region B1. The peripheral gateelectrode 323 b may include a first peripheral polysilicon pattern 311b, a first peripheral ohmic pattern 315 b, and a first peripheral metalcontaining pattern 317 b, which are sequentially stacked on thesemiconductor substrate 301. Here, the peripheral gate insulating layer309, the first polysilicon mask pattern 311, the first ohmic layer 315,the first metal containing layer 317, and the first capping layer 319may be removed from the third region C1 to expose the entire top surfaceof the third region C1 of the semiconductor substrate 301. By contrast,since the first region A1 is covered with the first mask pattern 321,the first region A1 may not be etched by the etching process for formingthe peripheral gate electrode 323 b. The first mask pattern 321 may beremoved, after the etching process for forming the peripheral gateelectrode 323 b. A peripheral spacer 325 may be formed to cover sidesurfaces of the peripheral capping pattern 319 b, the peripheral gateelectrode 323 b, and the peripheral gate insulating pattern 309 b.

The first mask pattern 321 may be removed, after the formation of theperipheral spacer 325. Here, the first mask pattern 321 may protect thefirst region A1, when the peripheral spacer 325 is formed.

Referring to FIG. 17E, an ion implantation process may be performed toform peripheral source/drain regions 327 in portions of thesemiconductor substrate 301 which are located at both sides of theperipheral gate electrode 323 b. The first region A1 and the thirdregion C1 may be veiled by a mask, during the ion implantation process.After the formation of the peripheral source/drain regions 327, a secondinterlayered insulating layer 329 may be formed to fully cover thesemiconductor substrate 301. The second interlayered insulating layer329 may be formed of or include, for example, at least one of siliconoxide, silicon oxynitride, silicon nitride, or porous oxide. A polishingprocess on the second interlayered insulating layer 329 may be performedto expose a top surface of the first capping layer 319 on the firstregion A1 and to expose a top surface of the peripheral capping pattern319 b on the second region B1. The second interlayered insulating layer329 may be formed to cover portions of the second region B1 of thesemiconductor substrate 301, which are not covered by the peripheralgate electrode 323 b, and to fully cover the third region C1 of thesemiconductor substrate 301.

Referring to FIG. 17F, a second capping layer 331 may be formed on thesemiconductor substrate 301. The second capping layer 331 may be formedof or include, for example, silicon nitride. A second mask pattern 333may be formed on the second capping layer 331 to define a position andshape of a bit line BL to be formed on the first region A1. The secondmask pattern 333 may include, for example, at least one of a photoresistpattern or a carbon containing layer. The second mask pattern 333 may beformed to fully cover the second and third regions B1 and C1.Thereafter, the second capping layer 331, the first capping layer 319,the first metal containing layer 317, the first polysilicon mask pattern311, and the second polysilicon pattern 314 may be etched using thesecond mask pattern 333 as an etch mask, and thus, a bit line contact DCand a bit line BL, a first capping pattern 319 a, and a second cappingpattern 331 a, which are stacked on the bit line contact DC, may beformed on the first region A1. When viewed in a plan view, the bit linecontact DC may be formed at a position corresponding to each of thefirst contact plugs 235 of FIG. 8A. When viewed in a plan view, the bitline BL may be formed at a position corresponding to the bit line 240 ofFIG. 9A. The bit line BL may be in contact with the bit line contact DC.The bit line BL may include a first cell ohmic pattern 315 a and a firstcell metal containing pattern 317 a, which are sequentially stacked. Thebit line BL may further include a first cell polysilicon pattern 311 a.The etching process for forming the bit line BL may be performed topartially expose an inner side surface and a bottom surface of the bitline contact hole 313. Furthermore, a top surface of the firstinterlayered insulating layer 307 may be partially exposed. In the bitline contact hole 313, a side surface of the bit line contact DC may beexposed.

Referring to FIG. 17G, an insulating layer may be formed and etched toform a first insulating pattern 316 filling the bit line contact hole313. The first insulating pattern 316 may be formed of or include atleast one of silicon nitride, silicon oxide, or silicon oxynitride andmay be formed to have a single- or multi-layered structure. The topsurface of the first interlayered insulating layer 307 may be exposed,after the formation of the first insulating pattern 316. A bit linespacer 335 may be formed to cover side surfaces of the bit line BL, thefirst capping pattern 319 a, and the second capping pattern 331 a, andthe formation of the bit line spacer 335 may include conformally forminga spacer layer on the semiconductor substrate 301 and anisotropicallyetching the spacer layer. The bit line spacer 335 may be formed of orinclude at least one of silicon nitride, silicon oxide, or siliconoxynitride and may be formed to have a single- or multi-layeredstructure.

Referring to FIG. 17H, the first interlayered insulating layer 307between the bit lines BL may be etched to form a storage node contacthole exposing the second impurity injection region 305 b. Here, thefirst insulating pattern 316, the device isolation layer 303, and thesemiconductor substrate 301 may be partially etched. A dopedpoly-silicon layer may be deposited on the semiconductor substrate 301to fill the storage node contact hole, and then, an anisotropic etchingprocess may be performed to form a storage node contact BC partiallyfilling the storage node contact hole. When viewed in a plan view, aposition of the storage node contact BC may correspond to that of thesecond contact plug 255 of FIG. 11A. On the second region B1, the secondcapping layer 331 and the second interlayered insulating layer 329 maybe sequentially patterned to form a peripheral contact hole 339 exposingthe peripheral source/drain region 327. A silicidation process may beperformed to form a second ohmic layer 341 a on the storage node contactBC and to form a third ohmic layer 341 b on a top surface of thesemiconductor substrate 301 exposed by the peripheral contact hole 339.The second ohmic layer 341 a and the third ohmic layer 341 b may beformed of or include, for example, cobalt silicide.

Referring to FIG. 17I, a second metal containing layer 343 may be formedon the semiconductor substrate 301 to fill the storage node contact holeand the peripheral contact hole 339. The second metal containing layer343 may be formed of or include, for example, titanium nitride ortungsten.

Referring to FIG. 17J, the second metal containing layer 343 may beetched to form a landing pad LP, which is electrically connected to thestorage node contact BC, on the first region A1. The etching of thesecond metal containing layer 343 may be performed to form a peripheralconductive pattern 343 bw on the second region B1 and to form aperipheral contact 343 bc in the peripheral contact hole 339. Theperipheral conductive pattern 343 bw may be an interconnection line or acontact pad, which is provided on the peripheral circuit region. Theetching of the second metal containing layer 343 may be performed toform first to third dummy conductive patterns 343 d 1, 343 d 2, and 343d 3 on the second and third regions B1 and C1. The first to third dummyconductive patterns 343 d 1, 343 d 2, and 343 d 3 may be formed toprevent a dishing phenomenon from occurring in a subsequent process ofpolishing an insulating separation layer 347. On the second region B1, adistance between the peripheral conductive pattern 343 bw and the firstdummy conductive pattern 343 d 1 adjacent thereto may be equal orsimilar to a distance between the landing pads LP. On the third regionC1, a distance between the third dummy conductive patterns 343 d 3adjacent to each other may be equal or similar to the distance betweenthe landing pads LP. However, the first to third dummy conductivepatterns 343 d 1, 343 d 2, and 343 d 3 may not be formed at a portion ofthe third region C1 for a through electrode 367 to be formed in asubsequent process. That is, a distance between the second and thirddummy conductive patterns 343 d 2 and 343 d 3 adjacent thereto may begreater than the distance between the landing pads LP. The secondcapping layer 331 may be used as an etch stop layer, when the secondmetal containing layer 343 is etched. After the formation of the landingpads LP, the peripheral conductive pattern 343 bw, and the first tothird dummy conductive patterns 343 d 1, 343 d 2, and 343 d 3, theinsulating separation layer 347 may be formed on the semiconductorsubstrate 301. The insulating separation layer 347 may be thick enoughto fill a space between the landing pads LP. The insulating separationlayer 347 may be formed of or include, for example, silicon nitride. Theinsulating separation layer 347 may be formed to have a recessed region348 at the portion of the third region C1 for the through electrode 367.

Referring to FIG. 17K, a polishing process on the insulating separationlayer 347 may be performed to form a first separation pattern 347 abetween the landing pads LP, a second separation pattern 347 b betweenthe peripheral conductive pattern 343 bw and the first dummy conductivepattern 343 d 1, a third separation pattern 347 c 1 between the thirddummy conductive patterns 343 d 3, and a fourth separation pattern 347 c2 between the second and third dummy conductive patterns 343 d 2 and 343d 3, and to expose top surfaces of the landing pads LP, the peripheralconductive pattern 343 bw, and the first to third dummy conductivepatterns 343 d 1, 343 d 2, and 343 d 3. The fourth separation pattern347 c 2 may be formed to have the recessed region 348 at its upperportion. The fourth separation pattern 347 c 2 may have a uniformthickness, between the second and third dummy conductive patterns 343 d2 and 343 d 3.

Referring to FIG. 17L, lower electrodes 351 may be formed on the firstregion A1 and on the landing pads LP, respectively. The lower electrodes351 may be formed to have a hollow cup shape or a circular pillar shape.The lower electrodes 351 may be formed of or include a metal containinglayer (e.g., a titanium nitride layer). A support pattern 353 may beformed between the lower electrodes 351 to prevent the lower electrodes351 from collapsing. The support pattern 353 may be formed of orinclude, for example, silicon nitride. A dielectric layer 355 may beformed to conformally cover exposed surfaces of the lower electrodes 351and the support pattern 353. The dielectric layer 355 may be formed ofor include at least one of high-k dielectric materials (e.g., aluminumoxide). An upper electrode 357 may be formed to cover the dielectriclayer 355. The upper electrode 357 may be formed of or include a metalcontaining layer (e.g., a titanium nitride layer). The upper electrode357, the dielectric layer 355, and the lower electrode 351 mayconstitute a capacitor.

Referring to FIG. 17M, a plate electrode layer may be formed on thesemiconductor substrate 301, and then, the plate electrode layer may beetched using a mask (not shown) veiling only the first region A1. Thus,on the first region A1, a plate electrode 359 a may be formed to coverthe upper electrode 357, and, on the third region C1, a remainingelectrode pattern 359 r may be formed in the recessed region 348. Theplate electrode layer may be formed of or include, for example, dopedsilicon germanium or tungsten. The remaining electrode pattern 359 r maybe formed to fill the recessed region 348 of the fourth separationpattern 347 c 2. Here, the remaining electrode pattern 359 r may beformed to have a top surface that is coplanar with a top surface of thefourth separation pattern 347 c 2.

Referring to FIG. 17N, a third interlayered insulating layer 361 may beformed on the semiconductor substrate 301. The third interlayeredinsulating layer 361 may be formed of or include, for example, a siliconoxide layer or a porous insulating layer. If, in the step of FIG. 17M,the recessed region 348 is not filled with the remaining electrodepattern 359 r, the third interlayered insulating layer 361 on the thirdregion C1 may have a recessed top surface profile as depicted by adotted line 361 rs. In this case, the top surface profile of the thirdinterlayered insulating layer 361 on the first to third regions A1, B1,and C1 may have a double stepwise structure. The formation of the doublestepwise structure may lead to an increase of technical difficulties ina subsequent process of polishing the third interlayered insulatinglayer 361, and consequently various issues (e.g., high cost, lowproductivity, large variation in characteristics, and a short circuitissue caused by a metal residue). However, according to some embodimentsof the inventive concept, since the recessed region 348 is filled withthe remaining electrode pattern 359 r, the double stepwise structure maynot be formed, and thus, it may be possible to overcome these issues.

Referring to FIG. 17O, a polishing process may be performed to allow thethird interlayered insulating layer 361 to have a flat top surface onthe first to third regions A1, B1, and C1. A through electrode hole 363may be formed on the third region C1 by successively etching the thirdinterlayered insulating layer 361, the remaining electrode pattern 359r, the fourth separation pattern 347 c 2, the second capping layer 331,the second interlayered insulating layer 329, and a portion of thesemiconductor substrate 301. A via insulating layer 365 may be formed onthe semiconductor substrate 301 to conformally cover an inner sidesurface and a bottom surface of the through electrode hole 363. The viainsulating layer 365 may be formed of or include, for example, at leastone of silicon oxide, silicon nitride, or silicon oxynitride. Aconductive layer may be formed on the semiconductor substrate 301 tofill the through electrode hole 363. The conductive layer may be formedof or include at least one of metallic materials (e.g., tungsten,aluminum, and copper). An anisotropic etching process or a polishingprocess may be performed on the conductive layer and the via insulatinglayer to expose the third interlayered insulating layer 361. Thus, thevia insulating layer 365 may remain in the through electrode hole 363,and the through electrode 367 may be formed in the through electrodehole 363.

Referring to FIG. 17P, a fourth interlayered insulating layer 369 may beformed on the third interlayered insulating layer 361. On the firstregion A1, a first upper contact 371 a may be formed to penetrate thefourth interlayered insulating layer 369 and the third interlayeredinsulating layer 361 and to be in contact with the plate electrode 359a. On the third region C1, a second upper contact 371 c may be formed topenetrate the fourth interlayered insulating layer 369 and to be incontact with the through electrode 367. A first upper line 373 a may beformed on the fourth interlayered insulating layer 369 to be in contactwith the first upper contact 371 a, and a second upper line 373 c may beformed on the fourth interlayered insulating layer 369 to be in contactwith the second upper contact 371 c. Each of the first and second uppercontacts 371 a and 371 c and the first and second upper lines 373 a and373 c may be formed of or include at least one of metallic materials(e.g., tungsten, aluminum, and copper). At least one of the first andsecond upper lines 373 a and 373 c may be used as an interconnectionline or a pad connected to an outer terminal. An upper insulating layer375 may be formed to cover the first and second upper lines 373 a and373 c. The upper insulating layer 375 may be formed of or include atleast one of silicon oxide, silicon nitride, silicon oxynitride, orpolyimide.

Referring to FIG. 17P, the semiconductor substrate 301 may include firstto third regions A1, B1, and C1, as described above. The bit lines BLmay be provided on the first region A1. The first capping pattern 319 aand the second capping pattern 331 a may be sequentially stacked on thebit lines BL. The storage node contact BC may be provided between thebit lines BL. The landing pad LP may be provided on the storage nodecontact BC. A capacitor including the lower electrode 351, thedielectric layer 355, and the upper electrode 357 may be provided on thelanding pad LP. The capacitor may be covered with the plate electrode359 a.

In the meantime, the peripheral gate insulating pattern 309 b, theperipheral gate electrode 323 b, and the peripheral capping pattern 319b may be sequentially stacked on the second region B1 of thesemiconductor substrate 301. The semiconductor substrate 301 around theperipheral gate electrode 323 b may be covered with the secondinterlayered insulating layer 329. The second capping layer 331 may beprovided on the second interlayered insulating layer 329 and theperipheral capping pattern 319 b. The peripheral conductive patterns 343bw may be provided on the second capping layer 331, and the first dummyconductive pattern 343 d 1 may be provided between peripheral conductivepatterns 343 bw.

A sum of thicknesses of the first and second capping patterns 319 a and331 a may correspond to a first thickness T1. The first thickness T1 maybe greater than a second thickness T2 of the peripheral capping pattern319 b. The first thickness T1 may be greater than a third thickness T3of the second capping layer 331. The first thickness T1 may besubstantially equal to a sum of the second and third thicknesses T2 andT3.

The second interlayered insulating layer 329 and the second cappinglayer 331 may be stacked on the third region C1 of the semiconductorsubstrate 301. The second dummy conductive pattern 343 d 2 and the thirddummy conductive patterns 343 d 3 may be provided on the second cappinglayer 331. A distance between the third dummy conductive patterns 343 d3 may be equal or similar to the distance between the landing pads LP. Adistance between the second and third dummy conductive patterns 343 d 2and 343 d 3 may be larger than the distance between the landing pads LP.The fourth separation pattern 347 c 2 may be provided between the secondand third dummy conductive patterns 343 d 2 and 343 d 3. The fourthseparation pattern 347 c 2 may be provided to have the recessed region348 at its upper portion. The recessed region 348 may be filled with theremaining electrode pattern 359 r. The remaining electrode pattern 359 rmay have a top surface that is coplanar with that of the fourthseparation pattern 347 c 2. The remaining electrode pattern 359 r may beformed of or include the same material as that of the plate electrode359 a. The remaining electrode pattern 359 r may be covered with thethird interlayered insulating layer 361. The through electrode 367 maybe provided to penetrate the third interlayered insulating layer 361,the remaining electrode pattern 359 r, the fourth separation pattern 347c 2, the second capping layer 331, and the second interlayeredinsulating layer 329 and may be extended into the semiconductorsubstrate 301. The via insulating layer 365 may be interposed betweenthe through electrode 367 and the remaining electrode pattern 359 r.

In the semiconductor device according to some example embodiments of theinventive concept, the remaining electrode pattern 359 r may be used toprevent formation of a double stepwise structure. Thus, it may bepossible to prevent large variation in characteristics and a shortcircuit issue caused by a metal residue and thereby to improvereliability of the device.

FIG. 18 is a sectional view illustrating a semiconductor deviceaccording to some example embodiments of the inventive concept.

Referring to FIG. 18, in a semiconductor device according to someembodiments of the inventive concept, the remaining electrode pattern359 r may have a protruding top surface that is higher than the topsurface of the fourth separation pattern 347 c 2. An upper portion ofthe remaining electrode pattern 359 r may be extended out of therecessed region 348 to be in contact with the top surface of the fourthseparation pattern 347 c 2. The structure of FIG. 18 may be formed byusing a mask pattern, which is formed to cover a region for theremaining electrode pattern 359 r when the plate electrode layer isetched in the step of FIG. 17M. Except for these differences, astructure of a semiconductor device or its fabricating method may besubstantially the same as those described above.

FIG. 19 is a sectional view illustrating a semiconductor deviceaccording to some example embodiments of the inventive concept.

Referring to FIG. 19, the upper electrode 357 a may be provided, but theplate electrode 359 a of FIG. 17P may not be provided. The upperelectrode 357 a may be formed of at least one of titanium nitride, dopedsilicon germanium, or tungsten. In addition, a remaining electrodepattern 357 r in the present embodiment may be formed of the samematerial as that of the upper electrode 357 a. The remaining electrodepattern 357 r and the upper electrode 357 a may be formed at the sametime. Except for these differences, a structure of a semiconductordevice or its fabricating method may be substantially the same as thosedescribed above.

According to some embodiments of the inventive concept, it may bepossible to improve reliability of a semiconductor device.

According to some embodiments of the inventive concept, it may bepossible to prevent a double stepwise structure from being formed,before a polishing process.

While example embodiments of the inventive concepts have beenparticularly shown and described, it will be understood by one ofordinary skill in the art that variations in form and detail may be madetherein without departing from the spirit and scope of the attachedclaims.

What is claimed is:
 1. A semiconductor device, comprising: asemiconductor substrate including a first region and a second region; adummy separation pattern provided on the second region of thesemiconductor substrate to have a recessed region at its upper portion;a remaining electrode pattern provided in the recessed region; and athrough electrode provided to penetrate an interlayered insulatinglayer, the remaining electrode pattern, and the dummy separation patternand to be extended into the semiconductor substrate, wherein theremaining electrode pattern is formed of a conductive layer.
 2. Thesemiconductor device of claim 1, further comprising: a first electrodeprovided on the first region of the semiconductor substrate; adielectric layer covering the first electrode; and a second electrodecovering the dielectric layer, wherein the second electrode contains asame material as the remaining electrode pattern.
 3. The semiconductordevice of claim 2, further comprising: first dummy pads provided on thesecond region of the semiconductor substrate; and a second dummy padprovided on the second region and adjacent to at least one of the firstdummy pads, wherein the dummy separation pattern is provided between thefirst dummy pads, and a first space between the first dummy pads isgreater than a second space between the second dummy pad and one of thefirst dummy pads adjacent the second dummy pad.
 4. The semiconductordevice of claim 3, further comprising: landing pads, which are providedon the first region and between a lower electrode and the semiconductorsubstrate and are spaced apart from each other, wherein the first spaceis greater than a third space between the landing pads.
 5. Thesemiconductor device of claim 4, further comprising: a bit line providedbetween the landing pads and the semiconductor substrate andelectrically disconnected from the landing pad; a bit line cappingpattern interposed between the bit line and the landing pad; aperipheral gate electrode provided on the second region of thesemiconductor substrate and spaced apart from the through electrode; anda peripheral gate capping pattern provided on the peripheral gateelectrode, wherein the bit line capping pattern has a first thickness,the peripheral gate capping pattern has a second thickness, and thefirst thickness is greater than the second thickness.
 6. Thesemiconductor device of claim 5, further comprising: an etch stop layer,which is provided on the peripheral gate capping pattern and has a thirdthickness, wherein the first thickness is greater than the thirdthickness.
 7. The semiconductor device of claim 6, wherein a sum of thethird thickness and the second thickness is equal to the firstthickness.
 8. A semiconductor device, comprising: a semiconductorsubstrate including a first region and a second region; landing padsprovided on the first region of the semiconductor substrate and spacedapart from each other by a first space; first dummy pads provided on thesecond region of the semiconductor substrate and spaced apart from eachother by a second space greater than the first space; first electrodesprovided on the landing pads, respectively; a dummy separation patternprovided between the first dummy pads to have a recessed region at itsupper portion; and a remaining electrode pattern filling the recessedregion, wherein the remaining electrode pattern is formed of aconductive layer.
 9. The semiconductor device of claim 8, furthercomprising: a through electrode, which is provided on the second regionto penetrate the remaining electrode pattern and the dummy separationpattern and to be extended into the semiconductor substrate.